Photomask technology 2009 : 14-17 September 2009 : Monterey, California, United States. : SPIE conference on photomask technology 2009 : 29th international symposium on photomask technology : Sep 2009, Monterey, CA. (SPIE Proceedings ; 7488)

Photomask technology 2009 : 14-17 September 2009 : Monterey, California, United States. : SPIE conference on photomask technology 2009 : 29th international symposium on photomask technology : Sep 2009, Monterey, CA.

(SPIE Proceedings ; 7488)

Call No. (NDL): M17-10-1817
Bibliographic ID of National Diet Library: 000010665500

Material type: 図書

Author: Zurbrick, Larry S.ほか

Publisher: SPIE

Publication date: c2009.

Material Format: Paper

Capacity, size, etc.: 2 parts : ill. ; 28 cm.

NDC: -

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Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN (set): 9780819477958 (set)
ISSN (series): 0277-786X
Title: Photomask technology 2009 : 14-17 September 2009 : Monterey, California, United States. : SPIE conference on photomask technology 2009 : 29th international symposium on photomask technology : Sep 2009, Monterey, CA.
Series Title: SPIE Proceedings ; 7488
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 7488.
Author Heading: Zurbrick, Larry S.
Montgomery, M. Warren.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2009.
Publication Date (W3CDTF): 2009
Extent: 2 parts : ill. ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Integrated circuits -- Masks -- Congresses.
Masks (Electronics) -- Congresses.
Microlithography -- Congresses.
LCC: TK7874
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-10-1817
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000010665500
http://id.ndl.go.jp/bib/000010665500
OCLC No.: 489212836
https://www.worldcat.org/oclc/489212836
Bibliographic Record Category (NDL): 215