Silicon carbide and related materials 2008 : selected, peer reviewed papers from the 7th European conference on silicon carbide and related materials, September 7-11, Barcelona, Spain. (Materials Science Forum ; 615-617)

Silicon carbide and related materials 2008 : selected, peer reviewed papers from the 7th European conference on silicon carbide and related materials, September 7-11, Barcelona, Spain.

(Materials Science Forum ; 615-617)

Call No. (NDL): M17-10-1938
Bibliographic ID of National Diet Library: 000010692881

Material type: 図書

Author: Pérez-Tomás, Amador.ほか

Publisher: Trans Tech Publications

Publication date: c2009.

Material Format: Paper

Capacity, size, etc.: xxiv, 1021 p. : ill. ; 25 cm.

NDC: -

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Notes on use

Note (General)：: Selected papers.

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Paper

Material Type: 図書
ISSN (series): 0255-5476
Title: Silicon carbide and related materials 2008 : selected, peer reviewed papers from the 7th European conference on silicon carbide and related materials, September 7-11, Barcelona, Spain.
Series Title: Materials Science Forum ; 615-617
Title Heading: Materials science forum ; v. 615-617.
Author Heading: Pérez-Tomás, Amador.
European Conference on Silicon Carbide and Related Materials (7th : 2008 : Barcelona, Spain)
Publication, Distribution, etc.: Stafa-Zurich : Trans Tech Publications
Publication Date: c2009.
Publication Date (W3CDTF): 2009
Extent: xxiv, 1021 p. : ill. ; 25 cm.
Additional Title: ECSCRM 2008 : Sep 2008, Barcelona, Spain.
Place of Publication (Country Code): CH
Text Language Code: eng
Subject Heading: Silicon carbide -- Congresses.
Silicon carbide -- Electric properties -- Congresses.
LCC: TK7871.15.S56
DDC: 620.193
NDLC: M17
Note (General): Selected papers.
Note (Bibliography): Includes bibliographical references and indexes.
Holding library: 国立国会図書館
Call No.: M17-10-1938
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000010692881
http://id.ndl.go.jp/bib/000010692881
OCLC No.: 359890443
https://www.worldcat.org/oclc/359890443
Bibliographic Record Category (NDL): 215

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