2009 17th international conference on advanced thermal processing of semiconductors : (RTP 2009) : Albany, New York, USA : 29 September-2 October 2009. : IEEE international conference on the advanced thermal processing of semiconductors : RTP2009 : Sep 2009, Albany, NY.

• Material Type: 図書
• ISBN: 9781424438143
• ISSN: 1944-0251
• Title: 2009 17th international conference on advanced thermal processing of semiconductors : (RTP 2009) : Albany, New York, USA : 29 September-2 October 2009. : IEEE international conference on the advanced thermal processing of semiconductors : RTP2009 : Sep 2009, Albany, NY.
• Author Heading: IEEE International Conference on Advanced Thermal Processing of Semiconductors (17th : 2009 : Albany, N.Y.)
• Publication, Distribution, etc.: Piscataway : IEEE
• Publication Date: c2009.
• Publication Date (W3CDTF): 2009
• Extent: 216 p. : ill. ; 28 cm.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Semiconductors -- Heat treatment -- Congresses.; Rapid thermal processing -- Congresses.; Semiconductor doping -- Congresses.; Semiconductors -- Defects -- Congresses.
• LCC: TK7871.85
• NDLC: M17
• Note (General): Papers and presentations.; IEEE cat no CFP09TPS-PRT.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-10-2586
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000010881644; http://id.ndl.go.jp/bib/000010881644
• OCLC No.: 600218973; https://www.worldcat.org/oclc/600218973
• Bibliographic Record Category (NDL): 215