Extreme ultraviolet (EUV) lithography : 22-25 February 2010 : San Jose, California, United States. : 1st SPIE conference on extreme ultraviolet (EUV) lithography : Feb 2010, San Jose, CA.

• Material Type: 図書
• ISBN (set): 9780819480507 (set)
• ISSN (series): 0277-786X
• Title: Extreme ultraviolet (EUV) lithography : 22-25 February 2010 : San Jose, California, United States. : 1st SPIE conference on extreme ultraviolet (EUV) lithography : Feb 2010, San Jose, CA.
• Series Title: SPIE Proceedings ; 7636
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 7636.
• Author Heading: SEMATECH, Inc.; La Fontaine, Bruno M.
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2010.
• Publication Date (W3CDTF): 2010
• Extent: 2 parts : ill. ; 28 cm.
• Alternative Title: SPIE advanced lithography
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Extreme ultraviolet lithography -- Congresses.; Ultraviolet radiation -- Industrial applications -- Congresses.; Lasers -- Industrial applications -- Congresses.; Photolithography -- Congresses.; Optical coatings -- Congresses.
• DDC: 621.3815/31
• NDLC: M17
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-10-3543
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000010926936; http://id.ndl.go.jp/bib/000010926936
• LC Control Number: 2010459440; https://lccn.loc.gov/2010459440
• OCLC No.: 647772811; https://www.worldcat.org/oclc/647772811
• Bibliographic Record Category (NDL): 215