Advances in resist materials and processing technology 27 : 22-24 February 2010 : San Jose, California, United States. : Feb 2010, San Jose, CA. (SPIE Proceedings ; 7639)

Advances in resist materials and processing technology 27 : 22-24 February 2010 : San Jose, California, United States. : Feb 2010, San Jose, CA.

(SPIE Proceedings ; 7639)

Call No. (NDL): M17-10-3720
Bibliographic ID of National Diet Library: 000010953772

Material type: 図書

Author: SEMATECH, Inc.ほか

Publisher: SPIE

Publication date: c2010.

Material Format: Paper

Capacity, size, etc.: 2 parts : ill. ; 28 cm.

NDC: -

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Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN (set): 9780819480538 (set)
ISSN (series): 0277-786X
Title: Advances in resist materials and processing technology 27 : 22-24 February 2010 : San Jose, California, United States. : Feb 2010, San Jose, CA.
Series Title: SPIE Proceedings ; 7639
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 7639.
Author Heading: SEMATECH, Inc.
Allen, Robert D.
Somervell, Mark Howell, 1973-
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2010.
Publication Date (W3CDTF): 2010
Extent: 2 parts : ill. ; 28 cm.
Alternative Title: SPIE advanced lithography
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Photoresists -- Congresses.
Microlithography -- Congresses.
LCC: TK7874
DDC: 621.3815/31
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-10-3720
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000010953772
http://id.ndl.go.jp/bib/000010953772
LC Control Number: 2010459431
https://lccn.loc.gov/2010459431
OCLC No.: 663822515
https://www.worldcat.org/oclc/663822515
Bibliographic Record Category (NDL): 215