Design for manufacturability through design-process integration 4 : 24-25 February 2010 : San Jose, California, United States. : Feb 2010, San Jose, CA.

• Material Type: 図書
• ISBN: 9780819480552
• ISSN (series): 0277-786X
• Title: Design for manufacturability through design-process integration 4 : 24-25 February 2010 : San Jose, California, United States. : Feb 2010, San Jose, CA.
• Series Title: SPIE Proceedings ; 7641
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 7641.
• Author Heading: SEMATECH, Inc.; Rieger, Michael L.; Thiele, Joerg.
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2010.
• Publication Date (W3CDTF): 2010
• Extent: 1 v. (various pagings) : ill. ; 28 cm.
• Alternative Title: SPIE advanced lithography
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Integrated circuits -- Design and construction -- Congresses.; Integrated circuits -- Defects -- Analysis -- Congresses.; Semiconductors -- Design and construction -- Congresses.; Semiconductor wafers -- Defects -- Analysis -- Congresses.; Microelectronics industry -- Quality control -- Congresses.; Quality control -- Congresses.
• LCC: TK7874
• NDLC: M17
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-10-3719
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000010953785; http://id.ndl.go.jp/bib/000010953785
• OCLC No.: 670239509; https://www.worldcat.org/oclc/670239509
• Bibliographic Record Category (NDL): 215