New trend in applied plasma science and technology : the seventh international symposium on applied plasma sciences -- (ISAPS '09) : Hamburg, Germany 31 August-4 September 2009. : Aug 2009, Hamburg, Germany.

• Material Type: 図書
• ISBN: 9780735408128
• ISSN (series): 0094-243X
• Title: New trend in applied plasma science and technology : the seventh international symposium on applied plasma sciences -- (ISAPS '09) : Hamburg, Germany 31 August-4 September 2009. : Aug 2009, Hamburg, Germany.
• Series Title: AIP Conference Proceedings ; 1282
• Title Heading: AIP conference proceedings ; no. 1282.
• Author Heading: Kobayashi, Akira.; Miyasaka, Takeshi.; Krása, Josef.; International Symposium on Applied Plasma Science (7th : 2009 : Hamburg, Germany)
• Publication, Distribution, etc.: Melville : American Institute of Physics
• Publication Date: 2010.
• Publication Date (W3CDTF): 2010
• Extent: xiv, 138 p. : ill. ; 28 cm.
• Alternative Title: New trend in applied plasma science and technology : the 7th international symposium on applied plasma sciences -- (ISAPS '09) : Hamburg, Germany 31 August-4 September 2009
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Plasma (Ionized gases) -- Congresses.
• LCC: QC717.6
• NDLC: M17
• Note (General): Selected papers.; "The international symposium on Applied Plasma Science (ISAPS) is held every 2 years (...) " -- p. ix.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-11-1373
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000011124331; http://id.ndl.go.jp/bib/000011124331
• LC Control Number: 2010911819; https://lccn.loc.gov/2010911819
• OCLC No.: 697979227; https://www.worldcat.org/oclc/697979227
• Bibliographic Record Category (NDL): 215