Metrology, inspection, and process control for microlithography 25 : 28 February-3 March 2011 : San Jose, United States : conference on metrology, inspection and process control for microlithography : SPIE's advanced lithography symposium : Feb 2011, San Jose, CA.

• Material Type: 図書
• ISBN (set): 9780819485304 (pbk. : set)
• ISSN (series): 0277786X
• Title: Metrology, inspection, and process control for microlithography 25 : 28 February-3 March 2011 : San Jose, United States : conference on metrology, inspection and process control for microlithography : SPIE's advanced lithography symposium : Feb 2011, San Jose, CA.
• Series Title: SPIE Proceedings ; 7971
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 7971.
• Author Heading: Raymond, Christopher J.
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2011.
• Publication Date (W3CDTF): 2011
• Extent: 2 parts
• Other physical details: ill. (some col.)
• Size: 28 cm.
• Additional Title: Metrology, inspection, and process control for microlithography 25 : 28 March-3 April 2011 : San Jose, California, United States.; SPIE advanced lithography.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Integrated circuits--Inspection--Congresses.; Integrated circuits--Measurement--Congresses.; Microlithography--Congresses.; Process control--Congresses.; Metrology; Microlithography; Process control; Scatterometry
• LCC: TK7874
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-12-324
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000011254285; http://id.ndl.go.jp/bib/000011254285
• OCLC No.: 751794108; https://www.worldcat.org/oclc/751794108
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 215