Development of multi-element high-k dielectric films for gigabit DRAM capacitors

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Material Type: 博士論文
Title: Development of multi-element high-k dielectric films for gigabit DRAM capacitors
Author/Editor: 大和昌樹 [著]
Author Heading: 大和, 昌樹ヤマト, マサキ
Publication, Distribution, etc.: [大和昌樹]
Publication Date: [2010]
Publication Date (W3CDTF): 2010
Extent: 1冊
Alternative Title: 超高集積DRAMキャパシタ用多元素系高誘電率膜の開発チョウコウシュウセキ DRAM キャパシタヨウタゲンソケイコウユウデンリツマクノカイハツ
Degree grantor/type: 広島大学
Date Granted: 平成22年3月5日
Date Granted (W3CDTF): 2010
Dissertation Number: 甲第5103号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: UT51
Target Audience: 一般
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2011-H12
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000011293284
http://id.ndl.go.jp/bib/000011293284
Bibliographic Record Category (NDL): 213