SiGeスパッタエピタキシー技術と高速デバイスへの応用

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Material Type: 博士論文
Title: SiGeスパッタエピタキシー技術と高速デバイスへの応用
Title Transcription: SiGe スパッタエピタキシーギジュツトコウソクデバイスエノオウヨウ
Author/Editor: 花房宏明 [著]
Author Heading: 花房, 宏明ハナフサ, ヒロアキ
Publication, Distribution, etc.: [花房宏明]
Publication Date: [2011]
Publication Date (W3CDTF): 2011
Extent: 1冊
Alternative Title: SiGe sputter epitaxy technology and its application to high-speed devices
Degree grantor/type: 東京農工大学
Date Granted: 平成23年6月15日
Date Granted (W3CDTF): 2011
Dissertation Number: 甲第741号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: jpn
NDLC: UT51
Target Audience: 一般
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2011-J47
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 023228421
http://id.ndl.go.jp/bib/023228421
Bibliographic Record Category (NDL): 213