Metrology, inspection, and process control for microlithography 26 : 13-16 February 2012 : San Jose, California, United States : SPIE conference on metrology, inspection, and process control for microlithography : Feb 2012, San Jose, CA.

• Material Type: 図書
• ISBN (set): 9780819489807 (set)
• ISSN (series): 0277786X
• Title: Metrology, inspection, and process control for microlithography 26 : 13-16 February 2012 : San Jose, California, United States : SPIE conference on metrology, inspection, and process control for microlithography : Feb 2012, San Jose, CA.
• Series Title: SPIE Proceedings ; 8324
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 8324. 0277-786X
• Author Heading: Starikov, Alexander, 1952-
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2012.
• Publication Date (W3CDTF): 2012
• Extent: 2 parts
• Other physical details: ill. (some col.)
• Size: 28 cm.
• Additional Title: SPIE advanced lithography.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Genre/Form Terms: Electronic books.
• Subject Heading: Integrated circuits--Inspection--Congresses.; Integrated circuits--Measurement--Congresses.; Microlithography--Congresses.; Process control--Congresses.
• LCC: TK7874
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Source: http://link.spie.org/PSISDG/8324/1
• Holding library: 国立国会図書館
• Call No.: M17-12-4063
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 023762471; http://id.ndl.go.jp/bib/023762471
• OCLC No.: 794059598; https://www.worldcat.org/oclc/794059598
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 215