Photomask and next-generation lithography mask technology 19 : 17-19 April 2012 : Yokohama, Japan : Apr 2012, Yokohama, Japan.

• Material Type: 図書
• ISBN: 9780819491367 (pbk.)
• ISSN (series): 0277786X
• Title: Photomask and next-generation lithography mask technology 19 : 17-19 April 2012 : Yokohama, Japan : Apr 2012, Yokohama, Japan.
• Series Title: SPIE Proceedings ; 8441
• Author Heading: Kato, Kokoro.
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2012.
• Publication Date (W3CDTF): 2012
• Extent: 1 v. (various pagings)
• Other physical details: ill.
• Size: 28 cm.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Masks (Electronics)--Congresses.; Integrated circuits--Masks--Congresses.; X-ray lithography--Congresses.; Microlithography--Congresses.; Optoelectronic devices--Design and construction--Congresses.; Mask technology; Photomask
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-13-297
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 023894136; http://id.ndl.go.jp/bib/023894136
• OCLC No.: 809547842; https://www.worldcat.org/oclc/809547842
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 215