Advances in resist materials and processing technology 30 : 25-27 February 2013 : San Jose, California, United States : Feb 2013, San Jose, CA. (SPIE Proceedings ; 8682)

Advances in resist materials and processing technology 30 : 25-27 February 2013 : San Jose, California, United States : Feb 2013, San Jose, CA.

(SPIE Proceedings ; 8682)

Call No. (NDL): M17-13-3313
Bibliographic ID of National Diet Library: 024618137

Material type: 図書

Author: Somervell, Mark Howell, 1973-ほか

Publisher: SPIE

Publication date: c2013.

Material Format: Paper

Capacity, size, etc.: 1 v. (various pagings) ; 28 cm.

NDC: -

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Notes on use

Note (General)：: Papers.

Other physical details：: ill. (some col.)

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Paper

Material Type: 図書
ISBN: 9780819494641
ISSN (series): 0277786X
Title: Advances in resist materials and processing technology 30 : 25-27 February 2013 : San Jose, California, United States : Feb 2013, San Jose, CA.
Series Title: SPIE Proceedings ; 8682
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 8682. 0277-786X
Author Heading: Somervell, Mark Howell, 1973-
Wallow, Thomas Ingolf.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2013.
Publication Date (W3CDTF): 2013
Extent: 1 v. (various pagings)
Other physical details: ill. (some col.)
Size: 28 cm.
Additional Title: SPIE advanced lithography.
Place of Publication (Country Code): US
Text Language Code: eng
Genre/Form Terms: Electronic books.
Subject Heading: Photoresists--Congresses.
Microlithography--Congresses.
LCC: TK7874
NDLC: M17
Target Audience: 一般
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Source: SPIE Digital Library
http://link.spie.org/PSISDG/8682/1
Holding library: 国立国会図書館
Call No.: M17-13-3313
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 024618137
http://id.ndl.go.jp/bib/024618137
OCLC No.: 847841190
https://www.worldcat.org/oclc/847841190
Cataloging Rule: Anglo-American Cataloging Rules
Bibliographic Record Category (NDL): 215