Extreme ultraviolet (EUV) lithography V : 24-27 February 2014 : San Jose, California, United States : extreme ultraviolet (EUV) lithography 5 conference : 2014 SPIE advanced lithography symposium : Feb 2014, San Jose, CA.

• Material Type: 図書
• ISBN (set): 9780819499714 (paperback : set); 0819499714 (paperback : set)
• ISSN (series): 0277-786X
• Title: Extreme ultraviolet (EUV) lithography V : 24-27 February 2014 : San Jose, California, United States : extreme ultraviolet (EUV) lithography 5 conference : 2014 SPIE advanced lithography symposium : Feb 2014, San Jose, CA.
• Series Title: SPIE Proceedings ; 9048
• Author Heading: Wood, Obert R. (Obert Reeves), 1943-; Panning, Eric M.
• Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
• Publication Date: [2014]
• Publication Date (W3CDTF): 2014
• Extent: 2 volumes (various pagings)
• Other physical details: illustrations (black and white, and colour)
• Size: 28 cm.
• Alternative Title: Extreme ultraviolet (EUV) lithography 5 : 24-27 February 2014 : San Jose, California, United States; SPIE advanced lithography
• Place of Publication (Country Code): US
• Text Language Code: eng
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• Subject Heading: Extreme ultraviolet lithography--Congresses.; Ultraviolet radiation--Industrial applications--Congresses.; Lasers--Industrial applications--Congresses.; Photolithography--Congresses.; Optical coatings--Congresses.; Lithography; EUV
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-14-2840
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 025507669; http://id.ndl.go.jp/bib/025507669
• OCLC No.: 890145270; https://www.worldcat.org/oclc/890145270
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215