Handbook of crystal growth. Volume III, thin films and epitaxy

• Material Type: 図書
• ISBN: 9780444633392 (Part A : hardback); 0444633391 (Part A : hardback); 9780444633385 (Part B : hardback); 0444633383 (Part B : hardback)
• ISBN (set): 0444633049 (set : hardback); 9780444633040 (set : hardback)
• Title: Handbook of crystal growth.
• Volume: Volume III
• Part Title: thin films and epitaxy
• Author/Editor: editor-in-chief, Tatau Nishinga; volume editor, Thomas F. Kuech.
• Edition: Second edition.
• Author Heading: 西永, 頌, 1939- ニシナガ, タタウ, 1939- ( 00137783 )Authorities; Kuech, T. F.
• Publication, Distribution, etc.: Amsterdam, The Netherlands : Elsevier (出版)
• Publication Date: 2015.
• Publication Date (W3CDTF): 2015
• Extent: 2 volumes (xvii, 1346 pages)
• Size: 25 cm
• Alternative Title: Thin films and epitaxy
• Additional Title: Basic techniques.; Materials, processes, and technology.
• Place of Publication (Country Code): NL
• Text Language Code: eng
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• Subject Heading: Crystal growth.; Epitaxy.; Semiconductors.
• LCC: QD921
• DDC: 548/.5
• NDLC: MC145
• Target Audience: 一般
• Note (General): First edition published in 1993 : 2 volumes published in Amsterdam, The Netherlands, by North-Holland; and 1 volume published in Amsterdam by Elsevier; Author's name should read Nishinaga.
• Note (Bibliography): Includes bibliographical references and index.
• Holding library: 国立国会図書館
• Call No.: MC145-B45
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 025734950; http://id.ndl.go.jp/bib/025734950
• OCLC No.: 902760993; https://www.worldcat.org/oclc/902760993
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 211

• Contents: Part A. Basic techniquesPart B. Materials, processes, and technology.(Provided by: 国立国会図書館蔵書)