Alternative lithographic technologies VII : 23-26 February 2015 : San Jose, California, United States : alternative lithography conference : Feb 2015, San Jose, CA.

• Material Type: 図書
• ISBN: 9781628415254; 1628415258
• ISSN (series): 0277-786X
• Title: Alternative lithographic technologies VII : 23-26 February 2015 : San Jose, California, United States : alternative lithography conference : Feb 2015, San Jose, CA.
• Series Title: SPIE Proceedings ; 9423
• Title Heading: Proceedings of SPIE--the International Society for Optical Engineering ; v. 9423. 0277-786X
• Author Heading: Resnick, Douglas J.; Bencher, Christopher.
• Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
• Publication Date: [2015]; 著作権日付 : ©2015
• Publication Date (W3CDTF): 2015
• Extent: 1 volume (various pagings)
• Other physical details: illustrations
• Size: 28 cm.
• Alternative Title: Alternative lithographic technologies 7 : 23-26 February 2015 : San Jose, California, United States; SPIE. advanced lithography
• Place of Publication (Country Code): US
• Text Language Code: eng
• Genre/Form Terms: Conference proceedings.
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• Subject Heading: Extreme ultraviolet lithography--Congresses.; Lithography, Electron beam--Congresses.; Microlithography--Industrial applications--Congresses.; Masks (Electronics)--Congresses.; Extreme ultraviolet lithography.; Lithography, Electron beam.; Masks (Electronics); Microlithography--Industrial applications.
• LCC: TK7872.M3
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-15-2586
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 026523627; http://id.ndl.go.jp/bib/026523627
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215