Photomask Japan 2015: photomask and next-generation lithography mask technology XXII : 20-22 April 2015 : Yokohama, Japan : Apr 2015, Yokohama, Japan.

• Material Type: 図書
• ISBN: 9781628418712
• ISSN (series): 0277-786X
• Title: Photomask Japan 2015: photomask and next-generation lithography mask technology XXII : 20-22 April 2015 : Yokohama, Japan : Apr 2015, Yokohama, Japan.
• Series Title: SPIE Proceedings ; 9658
• Title Heading: Proceedings of SPIE--the International Society for Optical Engineering ; v. 9658. 0277-786X
• Author Heading: Yoshioka, Nobuyuki.; Photomask Japan.; SPIE (Society)
• Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
• Publication Date: [2015]; 著作権日付 : ©2015
• Publication Date (W3CDTF): 2015
• Extent: 1 volume (various pagings)
• Other physical details: illustrations
• Size: 28 cm.
• Alternative Title: Photomask Japan 2015: photomask and next-generation lithography mask technology 22 : 20-22 April 2015 : Yokohama, Japan
• Place of Publication (Country Code): US
• Text Language Code: eng
• Genre/Form Terms: Conference papers and proceedings.
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• Subject Heading: Masks (Electronics)--Congresses.; Integrated circuits--Masks--Congresses.; X-ray lithography--Congresses.; Microlithography--Congresses.; Optoelectronic devices--Design and construction--Congresses.; Integrated circuits--Masks.; Masks (Electronics); Microlithography.; Optoelectronic devices--Design and construction.; X-ray lithography.
• LCC: TK7878
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-16-142
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 026839440; http://id.ndl.go.jp/bib/026839440
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215