Photomask Japan 2016: XXIII symposium on photomask and next-generation lithography mask technology : 6-8 April 2016 : Yokohama, Japan : Apr 2016, Yokohama, Japan. (SPIE Proceedings ; 9984)

Photomask Japan 2016: XXIII symposium on photomask and next-generation lithography mask technology : 6-8 April 2016 : Yokohama, Japan : Apr 2016, Yokohama, Japan.

(SPIE Proceedings ; 9984)

Call No. (NDL): M17-17-1969
Bibliographic ID of National Diet Library: 027737121

Material type: 図書

Author: Photomask Japan.ほか

Publisher: SPIE

Publication date: [2016]

Material Format: Paper

Capacity, size, etc.: 1 volume (various pagings) ; 28 cm.

NDC: -

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Notes on use

Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN: 9781510603721
ISSN (series): 0277-786X
Title: Photomask Japan 2016: XXIII symposium on photomask and next-generation lithography mask technology : 6-8 April 2016 : Yokohama, Japan : Apr 2016, Yokohama, Japan.
Series Title: SPIE Proceedings ; 9984
Author Heading: Photomask Japan.
SPIE (Society)
Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
Publication Date: [2016]
Publication Date (W3CDTF): 2016
Extent: 1 volume (various pagings)
Size: 28 cm.
Alternative Title: Photomask Japan 2016: 23 symposium on photomask and next-generation lithography mask technology : 6-8 April 2016 : Yokohama, Japan
Place of Publication (Country Code): US
Text Language Code: eng
Content Type: text
Media Type: unmediated
Carrier Type: volume
NDLC: M17
Target Audience: 一般
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-17-1969
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 027737121
http://id.ndl.go.jp/bib/027737121
Cataloging Rule: RDA
Bibliographic Record Category (NDL): 215