Metrology, inspection, and process control for microlithography XXXI : 27 February-2 March 2017 : San Jose, California, United States : 31st conference on metrology, inspection, and process control for microlithography : Feb 2017, San Jose, CA.

• Material Type: 図書
• ISBN (set): 9781510607415 (set)
• ISSN (series): 0277-786X
• Title: Metrology, inspection, and process control for microlithography XXXI : 27 February-2 March 2017 : San Jose, California, United States : 31st conference on metrology, inspection, and process control for microlithography : Feb 2017, San Jose, CA.
• Series Title: SPIE Proceedings ; 10145
• Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
• Publication Date: [2017]
• Publication Date (W3CDTF): 2017
• Extent: 2 volumes
• Size: 28 cm.
• Alternative Title: Metrology, inspection, and process control for microlithography 31 : 27 February-2 March 2017 : San Jose, California, United States; SPIE. advanced lithography
• Place of Publication (Country Code): US
• Text Language Code: eng
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-18-1305
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 028410494; http://id.ndl.go.jp/bib/028410494
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215