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Photomask Japan 2017: XXIV symposium on photomask and next-generation lithography mask technology : 5-7 April 2017 : Yokohama, Japan : PMJ2017 : photomask Japan conference : Apr 2017, Yokohama, Japan. (SPIE Proceedings ; 10454)

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Photomask Japan 2017: XXIV symposium on photomask and next-generation lithography mask technology : 5-7 April 2017 : Yokohama, Japan : PMJ2017 : photomask Japan conference : Apr 2017, Yokohama, Japan.

(SPIE Proceedings ; 10454)

Call No. (NDL)
M17-19-79
Bibliographic ID of National Diet Library
028591560
Material type
図書
Author
Photomask Japan.ほか
Publisher
SPIE
Publication date
[2017]
Material Format
Paper
Capacity, size, etc.
1 volume (various pagings) ; 28 cm.
NDC
-
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Paper

Material Type
図書
ISBN
9781510613898
ISSN (series)
0277-786X
Publication, Distribution, etc.
Publication Date
[2017]
Publication Date (W3CDTF)
2017
Extent
1 volume (various pagings)