Photomask Japan 2018: XXV symposium on photomask and next-generation lithography mask technology : 18-20 April 2018 : Yokohama, Japan : Apr 2018, Yokohama, Japan.

• Material Type: 図書
• ISBN: 9781510622012
• ISSN (series): 0277-786X
• Title: Photomask Japan 2018: XXV symposium on photomask and next-generation lithography mask technology : 18-20 April 2018 : Yokohama, Japan : Apr 2018, Yokohama, Japan.
• Series Title: SPIE Proceedings ; 10807
• Author Heading: Photomask Japan.; SPIE (Society)
• Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
• Publication Date: [2018]
• Publication Date (W3CDTF): 2018
• Extent: 1 volume (various pagings)
• Size: 28 cm.
• Alternative Title: Photomask Japan 2018: 25 symposium on photomask and next-generation lithography mask technology : 18-20 April 2018 : Yokohama, Japan; SPIE. photomask technology
• Place of Publication (Country Code): US
• Text Language Code: eng
• Content Type: text
• Media Type: unmediated
• Carrier Type: volume
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-20-27
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 029254966; http://id.ndl.go.jp/bib/029254966
• Cataloging Rule: RDA
• Bibliographic Record Category (NDL): 215