Extreme ultraviolet (EUV) lithography X : 25-28 February 2019 : San Jose, California, United States : Feb 2019, San Jose, CA. (SPIE Proceedings ; 10957)

Extreme ultraviolet (EUV) lithography X : 25-28 February 2019 : San Jose, California, United States : Feb 2019, San Jose, CA.

(SPIE Proceedings ; 10957)

Call No. (NDL): M17-20-603
Bibliographic ID of National Diet Library: 029690456

Material type: 図書

Author: -

Publisher: SPIE

Publication date: [2019]

Material Format: Paper

Capacity, size, etc.: 1 volume (various pagings) ; 28 cm.

NDC: -

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Notes on use

Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN: 9781510625617
ISSN (series): 0277-786X
Title: Extreme ultraviolet (EUV) lithography X : 25-28 February 2019 : San Jose, California, United States : Feb 2019, San Jose, CA.
Series Title: SPIE Proceedings ; 10957
Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
Publication Date: [2019]
Publication Date (W3CDTF): 2019
Extent: 1 volume (various pagings)
Size: 28 cm.
Alternative Title: Extreme ultraviolet (EUV) lithography 10 : 25-28 February 2019 : San Jose, California, United States
Extreme ultraviolet (EUV) lithography X : at SPIE advanced lithography : 25-28 February 2019 : San Jose, California, United States
Place of Publication (Country Code): US
Text Language Code: eng
Content Type: text
Media Type: unmediated
Carrier Type: volume
NDLC: M17
Target Audience: 一般
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-20-603
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 029690456
http://id.ndl.go.jp/bib/029690456
Cataloging Rule: RDA
Bibliographic Record Category (NDL): 215