Optical microlithography XXXII : 26-27 February 2019 : San Jose, California, United States : Feb 2019, San Jose, CA. (SPIE Proceedings ; 10961)

Optical microlithography XXXII : 26-27 February 2019 : San Jose, California, United States : Feb 2019, San Jose, CA.

(SPIE Proceedings ; 10961)

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Material Type: 図書
ISBN: 9781510625693
ISSN (series): 0277-786X
Title: Optical microlithography XXXII : 26-27 February 2019 : San Jose, California, United States : Feb 2019, San Jose, CA.
Series Title: SPIE Proceedings ; 10961
Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
Publication Date: [2019]
Publication Date (W3CDTF): 2019
Extent: 1 volume (various pagings)
Size: 28 cm.
Alternative Title: Optical microlithography 32 : 26-27 February 2019 : San Jose, California, United States
Optical microlithography XXXII : at SPIE advanced lithography : 26-27 February 2019 : San Jose, California, United States
Place of Publication (Country Code): US
Text Language Code: eng
Content Type: text
Media Type: unmediated
Carrier Type: volume
NDLC: M17
Target Audience: 一般
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-20-798
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 029840762
http://id.ndl.go.jp/bib/029840762
Cataloging Rule: RDA
Bibliographic Record Category (NDL): 215