Photomask Japan 2022: XXVIII symposium on photomask and next-generation lithography mask technology : 26-28 April 2022 : online only, Japan : Apr 2022, ------. (SPIE Proceedings ; 12325)

Photomask Japan 2022: XXVIII symposium on photomask and next-generation lithography mask technology : 26-28 April 2022 : online only, Japan : Apr 2022, ------.

(SPIE Proceedings ; 12325)

Call No. (NDL): M17-23-177
Bibliographic ID of National Diet Library: 032629701

Material type: 図書

Author: Photomask Japan.ほか

Publisher: SPIE

Publication date: [2022]

Material Format: Paper

Capacity, size, etc.: 1 volume (various pagings) ; 28 cm.

NDC: -

View All

Notes on use

Note (General)：: Papers.

Search by Bookstore

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper

Material Type: 図書
ISBN: 9781510657182
ISSN (series): 0277-786X
Title: Photomask Japan 2022: XXVIII symposium on photomask and next-generation lithography mask technology : 26-28 April 2022 : online only, Japan : Apr 2022, ------.
Series Title: SPIE Proceedings ; 12325
Author Heading: Photomask Japan.
SPIE (Society)
Publication, Distribution, etc.: Bellingham, Washington, USA : SPIE (出版)
Publication Date: [2022]
Publication Date (W3CDTF): 2022
Extent: 1 volume (various pagings)
Size: 28 cm.
Alternative Title: Photomask Japan 2022: 28 symposium on photomask and next-generation lithography mask technology : 26-28 April 2022 : online only, Japan
Place of Publication (Country Code): US
Text Language Code: eng
Content Type: text
Media Type: unmediated
Carrier Type: volume
NDLC: M17
Target Audience: 一般
Note (General): Papers.
Note (Bibliography): Includes bibliographical references.
Holding library: 国立国会図書館
Call No.: M17-23-177
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 032629701
http://id.ndl.go.jp/bib/032629701
Cataloging Rule: RDA
Bibliographic Record Category (NDL): 215