CHARACTERIZATION OF MOCVD (METAL ORGANIC CHEMICAL VAPOR DEPOSITION) GROWN EPITAXIAL CERAMIC OXIDE THIN FILMS (CONF CONF-891119-24)

CHARACTERIZATION OF MOCVD (METAL ORGANIC CHEMICAL VAPOR DEPOSITION) GROWN EPITAXIAL CERAMIC OXIDE THIN FILMS

(CONF CONF-891119-24)

Author: PARKER, J.C.//CHANG, H.L.M.//XU, J.J.//LAM, D.J. (ARGONNE NATIONAL LAB., IL (USA))

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Material Type: 図書
Title: CHARACTERIZATION OF MOCVD (METAL ORGANIC CHEMICAL VAPOR DEPOSITION) GROWN EPITAXIAL CERAMIC OXIDE THIN FILMS
Author/Editor: PARKER, J.C.//CHANG, H.L.M.//XU, J.J.//LAM, D.J. (ARGONNE NATIONAL LAB., IL (USA))
Series Title: CONF CONF-891119-24
Author Heading: PARKER, J.C
CHANG, H.L.M
XU, J.J
LAM, D.J
Publication Date: 1989.
Publication Date (W3CDTF): 1989
Extent: 6
Place of Publication (Country Code): us
Text Language Code: eng
Target Audience: 一般
Data Provider (Database): 日本原子力研究開発機構 : 日本原子力研究開発機構所蔵目録データベース