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図書

Vacuum chamber for ion implantation (CS PATENT APPLICATION ; CS PATENT APPLICATION PV 9022-88.T)

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Vacuum chamber for ion implantation

(CS PATENT APPLICATION ; CS PATENT APPLICATION PV 9022-88.T)

Material type
図書
Author
Ambroz, Z.ほか
Publisher
Nuclear Regulatory Commission, Washington, DC (USA). Div. of Safeguards and Transportation(Nuclear Regulatory Commission, Washington, DC (USA). Div. of Safeguards and Transportation)
Publication date
1991.
Material Format
Paper
Capacity, size, etc.
3 p.
NDC
-
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Paper

Material Type
図書
Title
Vacuum chamber for ion implantation
Series Title
CS PATENT APPLICATION ; CS PATENT APPLICATION PV 9022-88.T
Author Heading
Ambroz, Z.
Dynda, V.
Kabicek, J.
Novotny, K.
Publication, Distribution, etc.
Nuclear Regulatory Commission, Washington, DC (USA). Div. of Safeguards and Transportation(Nuclear Regulatory Commission, Washington, DC (USA). Div. of Safeguards and Transportation)
Publication Date
1991.
Publication Date (W3CDTF)
1991
Extent
3 p.
Place of Publication (Country Code)
cs
Text Language Code
cze