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図書

STRUKTURPROFILSIMULATION DICKER SCHICHTEN IN DER OPTISCHEN LITHOGRAPHIE MIT DNQ-NOVOLAK-BASIERENDEN PHOTORESISTS (FZKA ; FZKA-6111)

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STRUKTURPROFILSIMULATION DICKER SCHICHTEN IN DER OPTISCHEN LITHOGRAPHIE MIT DNQ-NOVOLAK-BASIERENDEN PHOTORESISTS

(FZKA ; FZKA-6111)

Material type
図書
Author
CHUNG, S.-J./HEIN, H.
Publisher
Forschungszentrum Karlsruhe GmbH Technik und Umwelt(Forschungszentrum Karlsruhe GmbH Technik und Umwelt)
Publication date
1998.
Material Format
Paper
Capacity, size, etc.
94
NDC
-
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Paper

Material Type
図書
Title
STRUKTURPROFILSIMULATION DICKER SCHICHTEN IN DER OPTISCHEN LITHOGRAPHIE MIT DNQ-NOVOLAK-BASIERENDEN PHOTORESISTS
Author/Editor
CHUNG, S.-J./HEIN, H.
Series Title
FZKA ; FZKA-6111
Author Heading
CHUNG, S.-J.
HEIN, H.
Publication, Distribution, etc.
Forschungszentrum Karlsruhe GmbH Technik und Umwelt(Forschungszentrum Karlsruhe GmbH Technik und Umwelt)
Publication Date
1998.
Publication Date (W3CDTF)
1998
Extent
94
Place of Publication (Country Code)
gw