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図書

ULTRAHIGH VACUUM PLASMA OXIDATION IN THE FABRICATION OF ULTRATHIN SILICON DIOXIDE FILMS (DOCTORAL THESIS) (PB ; PB2001-105968)

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ULTRAHIGH VACUUM PLASMA OXIDATION IN THE FABRICATION OF ULTRATHIN SILICON DIOXIDE FILMS (DOCTORAL THESIS)

(PB ; PB2001-105968)

Material type
図書
Author
T. MAJAMAA (HELSINKI UNIV. OF TECHNOLOGY, ESPOO (FINLAND). ELECTRON PHYSICS LAB)
Publisher
-
Publication date
2000.
Material Format
Paper
Capacity, size, etc.
104
NDC
-
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Paper

Material Type
図書
Title
ULTRAHIGH VACUUM PLASMA OXIDATION IN THE FABRICATION OF ULTRATHIN SILICON DIOXIDE FILMS (DOCTORAL THESIS)
Author/Editor
T. MAJAMAA (HELSINKI UNIV. OF TECHNOLOGY, ESPOO (FINLAND). ELECTRON PHYSICS LAB)
Series Title
PB ; PB2001-105968
Author Heading
T. MAJAMAA
Publication Date
2000.
Publication Date (W3CDTF)
2000
Extent
104
Place of Publication (Country Code)
us
Text Language Code
eng