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図書

The use of electron channeling patterns for process optimization of low-temperature epitaxial silicon using hot-wire chemical vapor deposition (NREL ; NREL/CP-520-26364; DE00750924)

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The use of electron channeling patterns for process optimization of low-temperature epitaxial silicon using hot-wire chemical vapor deposition

(NREL ; NREL/CP-520-26364; DE00750924)

Material type
図書
Author
Matson, R., Thiesen, J., Jones, K.M. [et al.]
Publisher
National Renewable Energy Lab.
Publication date
1998.10.25.
Material Format
Paper
Capacity, size, etc.
9p
NDC
-
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Paper

Material Type
図書
Title
The use of electron channeling patterns for process optimization of low-temperature epitaxial silicon using hot-wire chemical vapor deposition
Author/Editor
Matson, R., Thiesen, J., Jones, K.M. [et al.]
Series Title
NREL ; NREL/CP-520-26364; DE00750924
Author Heading
Matson, R.
Thiesen, J.
Jones, K.M.
Crandall, R.
Iwaniczko, E.
Mahan, H.
Publication, Distribution, etc.
Golden, CO (USA) : National Renewable Energy Lab.
Publication Date
1998.10.25.
Publication Date (W3CDTF)
1998
Extent
9p
Place of Publication (Country Code)
us