Dry etching for microelectronics

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Material Type: 図書
ISBN: 0444869050
Title: Dry etching for microelectronics
Author/Editor: edited by Ronald A. Powell
Author Heading: Powell, Ronald A.
https://ci.nii.ac.jp/author/DA00261897
Publication, Distribution, etc.: North-Holland
Distributors for the USA and Canada, Elsevier Science Pub. Co.
Publication Date: 1984
Publication Date (W3CDTF): 1984
Size: 24 cm
Place of Publication (Country Code): ne
Text Language Code: en
Subject Heading: Semiconductors -- Etching
Plasma etching
LCC: TK7871.85
Target Audience: 一般
Note (General): Bibliography: p. 223-294
Includes index
Related Material: Materials processing, theory and practices
https://cir.nii.ac.jp/crid/1130282271057631232
Related Material (URI): https://ci.nii.ac.jp/ncid/BA00157673#entity
https://lccn.loc.gov/84001145
Periodical Title: Materials processing, theory and practices
https://cir.nii.ac.jp/crid/1130282271057631232
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Books
https://ci.nii.ac.jp/books
NCID: https://ci.nii.ac.jp/ncid/BA00157673 : BA00157673
LC Control Number: 84001145
https://lccn.loc.gov/84001145