Patterning of material layers in submicron region : J. Wiley : Wiley Eastern

Patterning of material layers in submicron region : J. Wiley

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Material Type: 図書
ISBN: 0470220635
8122405614
Title: Patterning of material layers in submicron region
Volume: : J. Wiley
: Wiley Eastern
Author/Editor: U.S. Tandon, W.S. Khokle
Author Heading: Tandon, U. S.
Khokle, W. S.
Publication, Distribution, etc.: J. Wiley
Publication Date: 1993
Publication Date (W3CDTF): 1993
Size: 26 cm
Place of Publication (Country Code): us
Text Language Code: en
Subject Heading: Integrated circuits -- Masks
Ion beam lithograph
Lithography, Electron beam
X-ray lithography
LCC: TK7872.M3
Target Audience: 一般
Note (General): Includes bibliographical references and index
入力は遡及データによる
Related Material (URI): https://ci.nii.ac.jp/ncid/BA27988277#entity
https://lccn.loc.gov/92036072
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Books
https://ci.nii.ac.jp/books
NCID: https://ci.nii.ac.jp/ncid/BA27988277 : BA27988277
LC Control Number: 92036072
https://lccn.loc.gov/92036072