Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California pbk.

Author: Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering

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Material Type: 図書
ISBN: 089252958X
Title: Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California
Volume: pbk.
Author/Editor: Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering
Author Heading: Yanof, Arnold W.
https://ci.nii.ac.jp/author/DA08800000
Society of Photo-optical Instrumentation Engineers
https://ci.nii.ac.jp/author/DA00848546
Publication, Distribution, etc.: The Society
Publication Date: c1988
Publication Date (W3CDTF): 1988
Size: 28 cm
Place of Publication (Country Code): us
Text Language Code: en
Subject Heading: Lithography, Electron beam -- Congresses
X-ray lithography -- Congresses
Ion beam lithography -- Congresses
LCC: TK7874
Target Audience: 一般
Note (General): Includes bibliographies and index
Related Material: Proceedings
https://cir.nii.ac.jp/crid/1130282269217551104
Related Material (URI): https://ci.nii.ac.jp/ncid/BA07915758#entity
https://lccn.loc.gov/88060782
Periodical Title: Proceedings
https://cir.nii.ac.jp/crid/1130282269217551104
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Books
https://ci.nii.ac.jp/books
NCID: https://ci.nii.ac.jp/ncid/BA07915758 : BA07915758
LC Control Number: 88060782
https://lccn.loc.gov/88060782