Film deposition by plasma techniques : Germany : New York

Film deposition by plasma techniques : Germany

Notes on use

Note (General)：: Based on: Purazuma to seimaku no kiso / Mitsuharu Konuma. Cf. PrefIncludes bibliographical references and index

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Material Type: 図書
ISBN: 3540540571
0387540571
Title: Film deposition by plasma techniques
Volume: : Germany
: New York
Author/Editor: Mitsuharu Konuma
Author Heading: 小沼, 光晴コヌマ, ミツハル
https://ci.nii.ac.jp/author/DA00302633
Publication, Distribution, etc.: Springer-Verlag
Publication Date: c1992
Publication Date (W3CDTF): 1992
Size: 24 cm
Alternative Title: プラズマと成膜の基礎
Place of Publication (Country Code): gw
Text Language Code: en
Subject Heading: Thin films
Plasma-enhanced chemical vapor deposition
LCC: TK7871.15.F5
Target Audience: 一般
Note (General): Based on: Purazuma to seimaku no kiso / Mitsuharu Konuma. Cf. Pref
Includes bibliographical references and index
Related Material: Springer series on atoms + plasmas
https://cir.nii.ac.jp/crid/1130282273012237568
Related Material (URI): https://ci.nii.ac.jp/ncid/BA14397573#entity
Periodical Title: Springer series on atoms + plasmas
https://cir.nii.ac.jp/crid/1130282273012237568
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Books
https://ci.nii.ac.jp/books
NCID: https://ci.nii.ac.jp/ncid/BA14397573 : BA14397573