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図書

EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

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EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

Material type
図書
Author
Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology ... [et al.]
Publisher
SPIE
Publication date
c2006
Material Format
Paper
Capacity, size, etc.
28 cm
NDC
-
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Includes bibliographical references and author index

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Paper

Material Type
図書
ISBN
0819463566
Author/Editor
Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology ... [et al.]
Publication, Distribution, etc.
Publication Date
c2006
Publication Date (W3CDTF)
2006
Size
28 cm
Place of Publication (Country Code)
us