Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.

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Material Type: 図書
ISBN: 1558994742
Title: Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Author/Editor: editors, H.R. Huff ... [et al.]
Author Heading: Huff, Howard R.
https://ci.nii.ac.jp/author/DA1224203X
Publication, Distribution, etc.: Materials Research Society
Publication Date: 1999
Publication Date (W3CDTF): 1999
Size: 24 cm
Place of Publication (Country Code): us
Text Language Code: en
Subject Heading: Integrated circuits -- Ultra large scale integration -- Materials Congresses
Silicon oxide films Congresses
Gate array circuits -- Materials Congresses
Dielectrics Congresses
LCC: TK7874.76
Target Audience: 一般
Note (General): Includes bibliographical references
Related Material: Materials Research Society symposium proceedings
https://cir.nii.ac.jp/crid/1130282268858574848
Related Material (URI): https://ci.nii.ac.jp/ncid/BA43280580#entity
https://lccn.loc.gov/99039825
Periodical Title: Materials Research Society symposium proceedings
https://cir.nii.ac.jp/crid/1130282268858574848
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Books
https://ci.nii.ac.jp/books
NCID: https://ci.nii.ac.jp/ncid/BA43280580 : BA43280580
LC Control Number: 99039825
https://lccn.loc.gov/99039825