図書

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California

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Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California

Material type
図書
Author
David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Publisher
SPIE
Publication date
c1994
Material Format
Paper
Capacity, size, etc.
28 cm
NDC
-
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Includes bibliographical references and index

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Paper

Material Type
図書
ISBN
0819414891
Author/Editor
David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Publication, Distribution, etc.
Publication Date
c1994
Publication Date (W3CDTF)
1994
Size
28 cm
Place of Publication (Country Code)
us