Jump to main content
図書

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California

Icons representing 図書

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California

Material type
図書
Author
David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Publisher
SPIE
Publication date
c1994
Material Format
Paper
Capacity, size, etc.
28 cm
NDC
-
View All

Notes on use

Note (General):

Includes bibliographical references and index

Related materials as well as pre- and post-revision versions

ProceedingsLeave the NDL website.

Search by Bookstore

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

  • CiNii Research

    Search Service
    Paper
    You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper

Material Type
図書
ISBN
0819414891
Author/Editor
David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
Publication, Distribution, etc.
Publication Date
c1994
Publication Date (W3CDTF)
1994
Size
28 cm
Place of Publication (Country Code)
us