Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA : set

Material type: 図書

Author: Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

Publisher: SPIE

Publication date: c2001

Material Format: Paper

Capacity, size, etc.: 28 cm

NDC: -

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Note (General)：: Includes bibliographical references and author index

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Paper

Material Type: 図書
ISBN: 0819440310
Title: Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA
Volume: : set
Author/Editor: Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
Author Heading: Houlihan, Francis M.
Annual SPIE Cconference on Advances in Resist Ttechnology and Processing
Society of Photo-optical Instrumentation Engineers
https://ci.nii.ac.jp/author/DA00848546
Semiconductor Equipment and Materials International
https://ci.nii.ac.jp/author/DA0468648X
International SEMATECH
Publication, Distribution, etc.: SPIE
Publication Date: c2001
Publication Date (W3CDTF): 2001
Size: 28 cm
Alternative Title: Advances in resist technology and processing 18
Place of Publication (Country Code): us
Text Language Code: en
Subject Heading: Photoresists -- Congresses
Microlithography -- Congresses
LCC: TR940
Target Audience: 一般
Note (General): Includes bibliographical references and author index
Related Material: Proceedings
https://cir.nii.ac.jp/crid/1130282269217551104
Related Material (URI): https://ci.nii.ac.jp/ncid/BB29368259#entity
https://lccn.loc.gov/2002283519
Periodical Title: Proceedings
https://cir.nii.ac.jp/crid/1130282269217551104
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Books
https://ci.nii.ac.jp/books
NCID: https://ci.nii.ac.jp/ncid/BB29368259 : BB29368259
LC Control Number: 2002283519
https://lccn.loc.gov/2002283519