High-speed anisotropic wet etching of silicon and the effects of metal impurities in KOH solution

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Note (General)：: Thesis (Ph.D.)--Nagoya University. Graduate School of Engineering, 2005Kind of academic degree: 博士(工学)Date degree granted: 2005-03-25...

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Material Type: 図書
Title: High-speed anisotropic wet etching of silicon and the effects of metal impurities in KOH solution
Author/Editor: Hiroshi Tanaka
Author Heading: 田中, 浩タナカ, ヒロシ
Publication, Distribution, etc.: [s.n.]
Publication Date: [2005]
Publication Date (W3CDTF): 2005
Size: 30 cm
Alternative Title: シリコンの高速湿式異方性エッチングの開発ならびにKOH水溶液中金属不純物の効果
Text Language Code: en
Target Audience: 一般
Note (General): Thesis (Ph.D.)--Nagoya University. Graduate School of Engineering, 2005
Kind of academic degree: 博士(工学)
Date degree granted: 2005-03-25
Report number: 甲第6674号
Diploma number: 工博第1935号
Related Material (URI): https://ci.nii.ac.jp/ncid/BB13562900#entity
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Books
https://ci.nii.ac.jp/books
NCID: https://ci.nii.ac.jp/ncid/BB13562900 : BB13562900