Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California pbk.

Author: Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics

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Material Type: 図書
ISBN: 0892525061
Title: Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California
Volume: pbk.
Author/Editor: Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics
Author Heading: Wagner, Alfred
https://ci.nii.ac.jp/author/DA08746051
International Society for Hybrid Microelectronics
https://ci.nii.ac.jp/author/DA0043892X
Publication, Distribution, etc.: S.P.I.E.-- International Society for Optical Engineering
Publication Date: c1984
Publication Date (W3CDTF): 1984
Size: 28 cm
Place of Publication (Country Code): us
Text Language Code: en
Subject Heading: X-ray lithography -- Congresses
Lithography, Electron beam -- Congresses
Ion beam lithography -- Congresses
LCC: TK7874
Target Audience: 一般
Related Material: Proceedings
https://cir.nii.ac.jp/crid/1130282269217551104
Related Material (URI): https://ci.nii.ac.jp/ncid/BA23981458#entity
https://lccn.loc.gov/84050821
Periodical Title: Proceedings
https://cir.nii.ac.jp/crid/1130282269217551104
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Books
https://ci.nii.ac.jp/books
NCID: https://ci.nii.ac.jp/ncid/BA23981458 : BA23981458
LC Control Number: 84050821
https://lccn.loc.gov/84050821