Studies on fabrication of silicon thin films using plasma enhanced chemical vapor deposition and behaviors of radicals

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Note (General)：: Thesis (Ph.D.)--Nagoya University. Graduate School of Engineering, 2013Kind of academic degree: 博士(工学)Date degree granted: 2013-03-25...

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Material Type: 図書
Title: Studies on fabrication of silicon thin films using plasma enhanced chemical vapor deposition and behaviors of radicals
Author/Editor: Abe Yusuke
Author Heading: 阿部, 祐介アベ, ユウスケ
Publication, Distribution, etc.: [s.n.]
Publication Date: [2013]
Publication Date (W3CDTF): 2013
Size: 30 cm
Alternative Title: プラズマ化学気相堆積法を用いたシリコン薄膜の作製およびラジカルの挙動に関する研究
Text Language Code: en
Target Audience: 一般
Note (General): Thesis (Ph.D.)--Nagoya University. Graduate School of Engineering, 2013
Kind of academic degree: 博士(工学)
Date degree granted: 2013-03-25
Report number: 甲第10160号
Diploma number: 工博第2618号
Related Material (URI): https://ci.nii.ac.jp/ncid/BB12551647#entity
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Books
https://ci.nii.ac.jp/books
NCID: https://ci.nii.ac.jp/ncid/BB12551647 : BB12551647