Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California

Material type: 図書

Author: Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working Group

Publisher: S.P.I.E.-- the Society of Photo-optical Instrumentation Engineers

Publication date: c1979

Material Format: Paper

Capacity, size, etc.: 28 cm

NDC: -

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Note (General)：: Proceedings of a seminarIncludes bibliographical references and indexes

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Proceedings of the Society of Photo-Optical Instrumentation Engineers

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Paper

Material Type: 図書
ISBN: 089252202X
Title: Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California
Author/Editor: Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working Group
Author Heading: Dey, Jim
Northern California Microphotomask/Masking Working Group
Publication, Distribution, etc.: S.P.I.E.-- the Society of Photo-optical Instrumentation Engineers
Publication Date: c1979
Publication Date (W3CDTF): 1979
Size: 28 cm
Place of Publication (Country Code): us
Text Language Code: en
Subject Heading: Semiconductors -- Congresses
Microlithography -- Congresses
Thin film circuits -- Congresses
Microelectronics -- Congresses
LCC: TK7871.85
Target Audience: 一般
Note (General): Proceedings of a seminar
Includes bibliographical references and indexes
Related Material: Proceedings of the Society of Photo-Optical Instrumentation Engineers
https://cir.nii.ac.jp/crid/1130282271110817536
Related Material (URI): https://ci.nii.ac.jp/ncid/BA23874276#entity
https://lccn.loc.gov/80105579
Periodical Title: Proceedings of the Society of Photo-Optical Instrumentation Engineers
https://cir.nii.ac.jp/crid/1130282271110817536
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Books
https://ci.nii.ac.jp/books
NCID: https://ci.nii.ac.jp/ncid/BA23874276 : BA23874276
LC Control Number: 80105579
https://lccn.loc.gov/80105579