図書

Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California

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Developments in semiconductor microlithography II : [seminar], April 4-5, 1977, San Jose, California

Material type
図書
Author
James W. Giffin, Bruce Ruff, editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with the International Society for Hybrid Microelectronics
Publisher
SPIE
Publication date
c1977
Material Format
Paper
Capacity, size, etc.
28 cm
NDC
-
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Paper

Material Type
図書
ISBN
0892521279
Author/Editor
James W. Giffin, Bruce Ruff, editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with the International Society for Hybrid Microelectronics
Publication, Distribution, etc.
Publication Date
c1977
Publication Date (W3CDTF)
1977
Size
28 cm
Place of Publication (Country Code)
us