図書

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California

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Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California

Material type
図書
Author
Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Publisher
SPIE
Publication date
c1990
Material Format
Paper
Capacity, size, etc.
28 cm
NDC
-
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Proceedings of the SPIE Symposium on MicrolithographyIncludes bibliographical references

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Paper

Material Type
図書
ISBN
0819403105
Author/Editor
Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Publication, Distribution, etc.
Publication Date
c1990
Publication Date (W3CDTF)
1990
Size
28 cm
Place of Publication (Country Code)
us