図書

Advances in resist materials and processing technology XXIV : 26-28 February 2007, San Jose, California, USA

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Advances in resist materials and processing technology XXIV : 26-28 February 2007, San Jose, California, USA

Material type
図書
Author
Qinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH
Publisher
SPIE
Publication date
c2007
Material Format
Paper
Capacity, size, etc.
28 cm
NDC
-
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Notes on use

Note (General):

Includes bibliographical references and author index"Part Two of Two Parts"--T.p.

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Paper

Material Type
図書
Author/Editor
Qinghuang Lin, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH
Publication, Distribution, etc.
Publication Date
c2007
Publication Date (W3CDTF)
2007
Size
28 cm
Alternative Title
Advances in resist materials and processing technology 24
Advances in resist materials and processing technology twenty-four
Place of Publication (Country Code)
us