Control of Reaction Mechanism of Photochemical Vapor Deposition of Aluminum Film by Timing of Source Introduction

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Material Type: 記事
Title: Control of Reaction Mechanism of Photochemical Vapor Deposition of Aluminum Film by Timing of Source Introduction
Author Heading: Sahara Kouji
Ouchi Hideki
Hanabusa Mitsugu
Publication Date: 1991
Publication Date (W3CDTF): 1991
Periodical title: Japanese Journal of Applied Physics
No. or year of volume/issue: 30 7
Volume: 30
Issue: 7
Pages: 1545-1548
Publication date of volume/issue (W3CDTF): 1991
ISSN (Periodical Title): 00214922
Publication (Periodical Title): 公益社団法人応用物理学会
Text Language Code: en
Subject Heading: photochemical vapor deposition
aluminum thin film
scanning tunneling microscope
island formation
surface topography
Target Audience: 一般
Related Material (URI): https://jlc.jst.go.jp/DN/JALC/00337555594?from=CiNii
Data Provider (Database): 国立情報学研究所 : CiNii Research
Original Data Provider (Database): CiNii Articles
NAID: 130003471025