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Molecular dynamics simulations and thermochemistry of reactive ion etching of silicon by chlorine, chlorine dimer, bromine, and bromine dimer cations LAUR982183 DE99 000765

Molecular dynamics simulations and thermochemistry of reactive ion etching of silicon by chlorine, chlorine dimer, bromine, and bromine dimer cations LAUR982183 DE99 000765
PaperMicroform規格・テクニカルリポート類
Valone, S. M, Hanson, D. E, Kress, J. D1998<LS-DE99/000765>
National Diet LibraryOther Libraries in Japan

Forwards QA program for 71000860 for transportation of radioactive matl.Registration as user of models SPEC-150 exposure device,C-1 source changer,660B exposure device & 650 source changer.Fee paid.

Forwards QA program for 71000860 for transportation of radioactive matl.Registration as user of models SPEC-150 exposure device,C-1 source changer,660B exposure device & 650 source changer.Fee paid.
Paper図書
HANSON, D. E.External (Affiliation Not Assigned)1996/06/26.
Other Libraries in Japan
  • Author HeadingHANSON, D. E.

INTRACAVITY FLUX DEPENDENT ABSORPTION IN E-BEAM PUMPED KRF (CONF ; CONF-881244-12)

INTRACAVITY FLUX DEPENDENT ABSORPTION IN E-BEAM PUMPED KRF (CONF ; CONF-881244-12)
Paper図書
SEAMANS, J.F.// KIMURA, W.D.// HANSON, D.E. (LOS ALAMOS NATIONAL LAB., NM (UNITED STATES))1988.
Other Libraries in Japan

ICF RESEARCH AT LOS ALAMOS (CONF ; CONF-871093-4)

ICF RESEARCH AT LOS ALAMOS (CONF ; CONF-871093-4)
Paper図書
1987.
Other Libraries in Japan

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