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一酸化二窒素ガス
を用いた急速熱処理による高品質極薄シリコン酸窒化膜の形成
一酸化二窒素ガスを用いた急速熱処理による高品質極薄シリコン酸窒化膜の形成
Paper
図書
野村, 滋, 室蘭工業大学
1998-1999
<Y151-H10650328>
National Diet Library
Subject Heading
シリコンテクノロジー
一酸化二窒素ガス
急速熱処理 極薄シリコン酸窒化膜 デバイスプロセス
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