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白金の触媒作用を用いるMOSデバイスゲ-ト酸化膜の絶縁耐圧性の向上
白金の触媒作用を用いるMOSデバイスゲ-ト酸化膜の絶縁耐圧性の向上
Paper
図書
小林, 光, 大阪大学
2000-2002
<Y151-H12450127>
National Diet Library
Subject Heading
白金処理
リ-ク電流 MOS シリコン SiO_2 化学酸化 低温プ...
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