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Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.

Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Paper図書
editors, H.R. Huff ... [et al.]Materials Research Society1999
Other Libraries in Japan
  • Subject Heading...lms Congresses Gate array circuits -- Materials Congresses Dielectrics Congresses
  • Subject Heading (ID)...lms Congresses Gate array circuits -- Materials Congresses Dielectrics Congresses

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