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大気圧非平衡プラズマを用いた酸化ケイ素及び酸化チタン表面への親水性の導入

大気圧非平衡プラズマを用いた酸化ケイ素及び酸化チタン表面への親水性の導入
Digital博士論文障害者向け資料あり
龍, 辰群馬大学大学院理工学府2019-03-22
National Diet Library
  • Subject Heading...on Water Vapor Silicon Oxide Titanium Oxide Hydroxy Group ...
  • Alternative Title...philicity onto Silicon Oxide and Titanium Oxide by Non-equ...
  • Alternative Title...philicity onto Silicon Oxide and Titanium Oxide by Non-equ...

Gate dielectric integrity: material, process, and tool qualification. : conference on gate dielectric integrity (GDI) : Jan 1999, San Jose, CA. (STP ; 1382)

Gate dielectric integrity: material, process, and tool qualification. : conference on gate dielectric integrity (GDI) : Jan 1999, San Jose, CA. (STP ; 1382)
Paper図書
ASTMc2000.<M17-06-1350>
National Diet Library
  • Subject Heading... -- Materials. Silicon oxide films -- Testing. Dielectrics...

大気圧非平衡プラズマを用いた酸化ケイ素及び酸化チタン表面への親水性の導入

大気圧非平衡プラズマを用いた酸化ケイ素及び酸化チタン表面への親水性の導入
Digital博士論文
龍, 辰群馬大学大学院理工学府2019-03-22
Available onlineOther Libraries in Japan
  • Subject Heading...on Water Vapor Silicon Oxide Titanium Oxide Hydroxy Group ...
  • Alternative Title...philicity onto Silicon Oxide and Titanium Oxide by Non-equ...
  • Alternative Title...philicity onto Silicon Oxide and Titanium Oxide by Non-equ...

The Si-SiO[2] system

The Si-SiO[2] system
Paper図書
edited by Pieter BalkElsevier1988
Other Libraries in Japan
  • Subject HeadingMetal oxide semiconductors Silicon oxide
  • Subject Heading (ID)Metal oxide semiconductors Silicon oxide

Silicon VLSI technology : fundamentals, practice and modeling

Silicon VLSI technology : fundamentals, practice and modeling
Paper図書
James D. Plummer, Michael Deal, Peter B. GriffinPrentice Hallc2000
Other Libraries in Japan
  • Subject Heading...uction Silicon Silicon oxide films Metal oxide semiconduct...
  • Subject Heading (ID)...uction Silicon Silicon oxide films Metal oxide semiconduct...

Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.

Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Paper図書
editors, H.R. Huff ... [et al.]Materials Research Society1999
Other Libraries in Japan
  • Subject Heading...als Congresses Silicon oxide films Congresses Gate array c...
  • Subject Heading (ID)...als Congresses Silicon oxide films Congresses Gate array c...

電荷移動モデルによるプラズマCVD窒化(酸化)Si膜の微視的結合構造変化の解析

電荷移動モデルによるプラズマCVD窒化(酸化)Si膜の微視的結合構造変化の解析
Digital文書・図像類
長谷川, 誠一, Hasegawa, Seiichi1996-04-14平成6(1994)年度 科学研究費補助金 一般研究(C) 研究成果報告書概要 = 1994 Fiscal Year Final Research Report Summary1993 – 1994p.2p.-
Other Libraries in Japan
  • Subject Heading...ilicon nitride Silicon oxide Plasma CVD Bonding Structure ...

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